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Multi channel chillers

Dual channel chiller or Three channel chiller for semiconductor industry

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  • There are two or more channels with the same/different specifications in one housing;
  • The temperature of two fluid channel systems can be controlled separately by one host;
  • One power supply system realizes the temperature control of 2 channels, reducing the wiring work time;
  • By controlling the variable frequency compressor, variable frequency fan, and electronic expansion valve at the same time, it can still maintain good temperature stability when the heat load fluctuates;
  • Use a pump without mechanical seal. There is no need to regularly check the pump for leakage and replace the mechanical seal.

Dual channel chillers
Three channel chillers
ETCU Heat exchange chillers
ModèleFLTZ-203W-2T
Pipelinechannel 1channel 2
Plage de température -20℃~+90℃ -20℃~+90℃
Capacité de refroidissement4kW@-10℃4kW@-10℃
Capacité de chauffage2kW2kW
Débit du fluide caloporteur20L/min@0.5MPa20L/min@0.5MPa
Heat conducting medium connection sizeZG3/4ZG3/4
Température ambiante10~35℃10~35℃
Humidité ambiante30~70%30~70%
Température de l'eau de refroidissement15~20℃15~20℃
Cooling water flow rate20L/min20L/min
Disjoncteur30A
Poids400 kg
Dimension en cm500*900*1600
Contrôle de la température du processusThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

ModèleFLTZ-406W/ETCU-015W
Pipelinechannel 1channel 2
Plage de température -45℃~+40℃+10℃~+80℃
Capacité de refroidissement11kW@-20℃
5kW@-40℃
13kW@+10℃
Capacité de chauffage2kW6kW
Débit du fluide caloporteur17L/min@0.7MPa17L/min@0.7MPa
Heat conducting medium connection sizeZG3/4ZG3/4
Température ambiante10~35℃10~35℃
Humidité ambiante30~70%30~70%
Température de l'eau de refroidissement15~20℃15~20℃
Cooling water flow rate40L/min20L/min
Disjoncteur80A
Poids550kg
Dimension en cm600*1000*1850
Contrôle de la température du processusThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

ModèleFLTZ-203W/ETCU-008W
Pipelinechannel 1channel 2channel 3
Plage de température -10℃~+60℃+30℃~+80℃-10℃~+80℃
Capacité de refroidissement4kW@-10℃/21kW@+20℃6 kW@+30℃3kW@-10℃
Capacité de chauffage4kW4.5+6kW3kW
Débit du fluide caloporteur17L/min@0.7MPa17L/min@0.7MPa17L/min@0.7MPa
Heat conducting medium connection sizeZG3/4ZG3/4ZG3/4
Température ambiante10~35 ℃10~35 ℃10~35 ℃
Humidité ambiante30~70%30~70%30~70%
Cooling water flow rate15~20℃15~20℃15~20℃
Température de l'eau de refroidissement30L/min@15~20℃15L/min@15~20℃15L/min@15~20℃
Disjoncteur100A
Poids600 kg
Dimension en cm600*1000*1700
Contrôle de la température du processusThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

ModèleFLTZ-203W/2T double systèmeFLTZ-305W/2T  dual systemFLTZ-406W/2T double système
Plage de température-20℃~90℃ -30℃~90℃-45℃~90℃
Débit du fluide caloporteur15~45l/min 6bar max
Capacité de chauffage2,5 kW2,5 kW2,5 kW2,5 kW3,5 kW3,5 kW
Capacité de refroidissement3kW à 15℃3kW à 15℃5kW à 15℃5kW à 15℃2.5kW à -35℃2.5kW à -35℃
Volume du liquide de circulation interne5L5L8L8L8L8L
Volume du réservoir d'expansion15L25L25L
Média conducteur de chaleurLiquide fluoré, antigel, huile de silicone conductrice de chaleur, etc.
RéfrigérantR404A/ R448
Interface du fluide caloporteurZG3/4
Interface avec l'eau de refroidissementZG3/4
Interface avec l'eau de refroidissement50L/min à 20℃600L/min à 20℃50L/min à 20℃
PuissanceTriphasé 220V/Triphasé 400V/Triphasé 460V
Contrôle de la température du processusLa température cible à distance peut être contrôlée en combinant le modèle créé par l'utilisateur et le modèle libre de l'utilisateur.
et l'algorithme en cascade

ModèleFLT-215W/ETCU-015W/ETCU-008W
Pipelinechannel 1channel 2channel 3
Plage de température-20℃~+50℃+30℃~+100℃+30℃~+40℃
Capacité de refroidissement15kW@-10℃13kW@PCW+15℃8kW@PCW+10℃
Capacité de chauffage2kW6kWPerte de chaleur de la pompe
Débit du fluide caloporteur30L/min@0.85MPa30L/min@0.85MPa20L/min@0.8MPa
Heat conducting medium connection sizeZG3/4ZG3/4ZG3/4
Température ambiante10~35 ℃10~35 ℃10~35 ℃
Humidité ambiante30~70%30~70%30~70%
Cooling water flow rate15~20℃15~20℃15~20℃
Température de l'eau de refroidissement30L/min@15~20℃15L/min@15~20℃15L/min@15~20℃
Disjoncteur75A
Poids600 kg
Dimension en cm600*1000*1700
Contrôle de la température du processusThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

ModèleETCU-005WETCU-015WETCU-030WETCU-050WETCU-100WETCU-200WETCU-300W
Plage de températureCooling water temperature +5℃~90℃
Précision du contrôle de la température±0.05℃(Température de sortie à l'état stable)
Température de l'eau de refroidissement7℃~30℃ Cooling water flow is controlled by Siemens/Honeywell regulating valves
Capacité de refroidissement5kW15kW30kW50kW100kW200kW300kW
Test conditions: When the maximum circulation amount, the temperature difference between
the temperature control temperature and the cooling water temperature is 15℃
Pompe de circulation7~20L/min 5bar15~40L/min 5bar20~60L/min 5bar40~110L/min 5bar150~250L/min 5bar250~500L/min 5bar400~650L/min 5bar
Volume du réservoir5L10L20L30L60L120L240L
Dimension en cm480*750*390480*750*390480*750*500CustomizationCustomizationCustomizationCustomization
Contrôle de la température du processusLa température cible à distance peut être contrôlée en combinant le modèle créé par l'utilisateur et le modèle libre de l'utilisateur.
 l'algorithme de l'arbre construit et l'algorithme de la cascade

FLTZ multi-channel chillers are widely used in the semiconductor industry due to their advantages such as precise temperature control, independent circuit management, and rapid cooling. The application scenarios of semiconductor chillers include wafer manufacturing, packaging testing, photolithography, etching, CVD/PVD deposition, cleaning processes, etc.

Ion implantation

The high-energy particle beam generated during ion implantation can cause local high temperatures. The process chiller can quickly remove heat to prevent thermal damage to the wafer.

Etching

During plasma etching (RIE, ICP, etc.), the chamber and electrodes need to be strictly temperature controlled to ensure etching uniformity. The chiller can provide a stable temperature environment for etching equipment and reduce process deviations

Chip packaging

In the packaging process of BGA, CSP, FCBGA, etc., the temperature control of welding and packaging materials affects reliability

PVD/CVD

CVD (such as LPCVD, PECVD) and PVD (such as sputtering coating) are used for thin film deposition, and the temperature control of the chamber and substrate affects the quality of the film.

Photolithography

The exposure system, optical lenses, laser light sources, and mask plates of the photolithography machine require precise temperature control to ensure pattern accuracy.

Wet cleaning

Used to help maintain deionized water within a specific temperature range to remove photoresist residues, metal contamination and particulate matter.

If you need independent temperature control for multiple different equipment or processes, and don’t want to buy multiple independent chillers, then FLTZ multi-channel chillers are a very ideal choice.

With the help of the Internet, we have built a global consulting, sales and service network. We have served more than 30,000 customers worldwide and have more than 90 patents.

Our chillers have been selected by more than 100 university laboratory projects around the world and exported to more than 20 countries. We have agents in various European countries and regions such as Singapore, Malaysia, Japan, South Korea, Qatar, Middle Eastern countries, Australia, the Netherlands, Spain and the United States.

We can customize it for you. For example, cooling capacity, power supply, size
We can customize the voltage and phase of the chiller according to your needs.

Generally, our multi-channel water dispenser for you includes two types: dual channel and triple channel,
If you have other channel requirements, you can contact us for customization.

LNEYA not only provides temperature control systems for semiconductor chillers, but also offers gas coolers for testing in downstream processes, and even provides temperature chambers.

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