LTS -20℃~80℃

2023-05-17 1470

It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer med...

Voir les détails

LTS -40℃~80℃

2023-05-17 1584

It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer...

Voir les détails

LTS -60℃~80℃

2023-05-17 1520

It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer med...

Voir les détails

LTS -80℃~80℃

2023-05-17 1516

It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer me...

Voir les détails